High Purity 99.5% Pure Boron Carbide B4c Ceramic Sputtering Target

High Purity 99.5% Pure Boron Carbide B4C Ceramic Sputtering TargetIntroductionThe following table is a component analysis certificate for  2N5 B4C sputtering target. The analytical methods used are:1. Analysis of metal elements using GDMS or ICP-OES;2. Gas element analysis using LECO.PACKAGE:     1 Stand

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High Purity 99.5% Pure Boron Carbide B4c Ceramic Sputtering Target

High Purity 99.5% Pure Boron Carbide B4C Ceramic Sputtering Target

Introduction

The following table is a component analysis certificate for  2N5 B4C sputtering target. The analytical methods used are:
1. Analysis of metal elements using GDMS or ICP-OES;

2. Gas element analysis using LECO.

High Purity 99.5% Pure Boron Carbide B4c Ceramic Sputtering TargetHigh Purity 99.5% Pure Boron Carbide B4c Ceramic Sputtering TargetHigh Purity 99.5% Pure Boron Carbide B4c Ceramic Sputtering TargetHigh Purity 99.5% Pure Boron Carbide B4c Ceramic Sputtering Target

High Purity 99.5% Pure Boron Carbide B4c Ceramic Sputtering Target
High Purity 99.5% Pure Boron Carbide B4c Ceramic Sputtering Target
High Purity 99.5% Pure Boron Carbide B4c Ceramic Sputtering Target
High Purity 99.5% Pure Boron Carbide B4c Ceramic Sputtering Target
High Purity 99.5% Pure Boron Carbide B4c Ceramic Sputtering Target
High Purity 99.5% Pure Boron Carbide B4c Ceramic Sputtering Target

PACKAGE:

     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.

     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.

     3 Responsible for the damage during the shipping process, will change the damage part for you for free.

DELIVERY TIME:15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity.

High Purity 99.5% Pure Boron Carbide B4c Ceramic Sputtering Target
 

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