99.99% pure zinc oxide sputtering target ZnO

                            Thin film coating materials ZnO sputtering target Our factory supply high quality Al2O3, SiO2, Si3N4, SiC, Nb2Ox, TiOx, ITO, AZO sputtering targets, as well as many other compound materials. As ceramic sputtering targets a

Featured Products

                            Thin film coating materials ZnO sputtering target 

Our factory supply high quality Al2O3, SiO2, Si3N4, SiC, Nb2Ox, TiOx, ITO, AZO sputtering targets, as well as many other compound materials. As ceramic sputtering targets are very fragile with very bad thermal conductivity, so usually it will be bonded with copper backing plate by indium or elastomer, to prolong service time.

Sintering technology are used  to produce ceramic sputtering targets, the shape can be round and rectangle.For round target,the diameter can be 1" to 14" , while thickness can be 3mm to 6.35mm, special size can be customized. For rectangle target, monolithic or several tiles construction will be supplied depending on the size.

  
Product: ZnO sputtering target
Purity:  99.99%
Size:  customized
Shape:  Planar 
Technology:  Powder Metallurgy
Packing:  Vacumm sealed, wooden case
     
99.99% Pure Zinc Oxide Sputtering Target ZnO                                
    99.99% Pure Zinc Oxide Sputtering Target ZnO
         99.99% Pure Zinc Oxide Sputtering Target ZnO
                                            PRODUCTION PROCESS
99.99% Pure Zinc Oxide Sputtering Target ZnO
99.99% Pure Zinc Oxide Sputtering Target ZnO
99.99% Pure Zinc Oxide Sputtering Target ZnO

 

Contact us

Please feel free to give your inquiry in the form below We will reply you in 24 hours